Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

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Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the ...

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Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL p...

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ژورنال

عنوان ژورنال: Micromachines

سال: 2013

ISSN: 2072-666X

DOI: 10.3390/mi4040370